ENTRY O2622 20240806 O262200000001 SUBENT O2622001 20240806 20260228 O262200100001 BIB 10 26 O262200100002 TITLE Electron screening in backward elastic scattering* O262200100003 AUTHOR (F.Schumann, S.Zavatarelli, L.Gialanella, U.Greife, O262200100004 M.Junker, D.Rogalla, C.Rolfs, F.Strieder, O262200100005 H.P.Trautvetter) O262200100006 INSTITUTE (2GERBOC,2ITYGVA,2ITYLGS) O262200100007 REFERENCE (J,EPJ/A,2,337,1998) O262200100008 FACILITY (DYNAM,2GERBOC) 4 MV Dynamitron tandem accelerator O262200100009 DETECTOR (SIBAR) Two Si-surface-barrier detectors (100 um thick,O262200100010 25 mm2 active area, 20 keV energy resolution). O262200100011 ERR-ANALYS (ERR-T) Total uncertainties are due to: O262200100012 Common uncertainties to all data points (5.2%) are: O262200100013 (ERR-1) current integration (0.35%) O262200100014 (ERR-2) loss of secondary electrons (0.9%) O262200100015 (ERR-3) variation of target thickness (1%) O262200100016 (ERR-4) beam neutrals (0.5%) O262200100017 (ERR-5) beam direction (0.08%) O262200100018 (ERR-6) normalization (5%) O262200100019 The uncertainties with each data point: O262200100020 - counting statistics (<=1%) O262200100021 - target thickness (<=0.2%) O262200100022 - incident beam energy (<=1.1%) O262200100023 - target peak convolution (<=2.5%) O262200100024 - detector efficiency (<=1.2%) O262200100025 CORRECTION Correction for electron screening effects 0.8% O262200100026 STATUS (TABLE,,F.Schumann+,J,EPJ/A,2,337,1998) Table 1 O262200100027 HISTORY (20240806C) VT O262200100028 ENDBIB 26 0 O262200100029 COMMON 7 6 O262200100030 ANG ERR-1 ERR-2 ERR-3 ERR-4 ERR-5 O262200100031 ERR-6 O262200100032 ADEG PER-CENT PER-CENT PER-CENT PER-CENT PER-CENT O262200100033 PER-CENT O262200100034 165. 0.35 0.9 1. 0.5 0.08O262200100035 5. O262200100036 ENDCOMMON 6 0 O262200100037 ENDSUBENT 36 0 O262200199999 SUBENT O2622002 20240806 20260228 O262200200001 BIB 2 3 O262200200002 REACTION (73-TA-181(A,EL)73-TA-181,,DA,,RTH) O262200200003 SAMPLE Ta2O5 target (~2.5 ug/cm2 thick) evaporated onto O262200200004 Si backing. O262200200005 ENDBIB 3 0 O262200200006 NOCOMMON 0 0 O262200200007 DATA 3 23 O262200200008 EN-CM DATA ERR-T O262200200009 MEV NO-DIM NO-DIM O262200200010 73.8 0.760 0.023 O262200200011 98.3 0.753 0.017 O262200200012 147.2 0.824 0.011 O262200200013 196.3 0.870 0.010 O262200200014 245.3 0.895 0.009 O262200200015 291.4 0.902 0.009 O262200200016 294.1 0.915 0.008 O262200200017 318.9 0.907 0.008 O262200200018 343.4 0.912 0.008 O262200200019 368.0 0.916 0.009 O262200200020 388.8 0.921 0.008 O262200200021 486.3 0.938 0.011 O262200200022 583.8 0.956 0.014 O262200200023 681.3 0.955 0.007 O262200200024 778.8 0.962 0.008 O262200200025 876.3 0.969 0.007 O262200200026 1071. 0.971 0.009 O262200200027 1266. 0.975 0.009 O262200200028 1462. 0.983 0.008 O262200200029 1949. 0.982 0.014 O262200200030 2437. 1.001 0.012 O262200200031 2925. 0.982 0.007 O262200200032 3901. 1.000 0.015 O262200200033 ENDDATA 25 0 O262200200034 ENDSUBENT 33 0 O262200299999 SUBENT O2622003 20240806 20260228 O262200300001 BIB 2 3 O262200300002 REACTION (74-W-184(A,EL)74-W-184,,DA,,RTH) O262200300003 SAMPLE WO3 target (~5.0 ug/cm2 thick) evaporated onto O262200300004 Si backing. O262200300005 ENDBIB 3 0 O262200300006 NOCOMMON 0 0 O262200300007 DATA 3 32 O262200300008 EN-CM DATA ERR-T O262200300009 MEV NO-DIM NO-DIM O262200300010 73.7 0.770 0.019 O262200300011 98.2 0.808 0.015 O262200300012 147.0 0.840 0.011 O262200300013 195.9 0.885 0.010 O262200300014 245.0 0.903 0.009 O262200300015 291.0 0.919 0.011 O262200300016 293.3 0.913 0.014 O262200300017 293.9 0.917 0.009 O262200300018 294.9 0.921 0.009 O262200300019 315.4 0.923 0.013 O262200300020 318.5 0.914 0.013 O262200300021 339.7 0.923 0.013 O262200300022 343.0 0.920 0.009 O262200300023 344.2 0.917 0.008 O262200300024 367.4 0.927 0.008 O262200300025 388.5 0.934 0.014 O262200300026 392.1 0.927 0.011 O262200300027 485.9 0.948 0.009 O262200300028 583.3 0.956 0.007 O262200300029 680.9 0.962 0.012 O262200300030 778.4 0.970 0.008 O262200300031 872.0 0.975 0.007 O262200300032 876.0 0.981 0.008 O262200300033 973.6 0.978 0.007 O262200300034 1071. 0.978 0.009 O262200300035 1266. 0.985 0.008 O262200300036 1462. 0.986 0.010 O262200300037 1949. 0.987 0.010 O262200300038 2437. 0.989 0.010 O262200300039 2926. 1.003 0.007 O262200300040 3414. 0.996 0.008 O262200300041 3902. 1.003 0.007 O262200300042 ENDDATA 34 0 O262200300043 ENDSUBENT 42 0 O262200399999 ENDENTRY 3 0 O262299999999